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Saurabh J. Ullal

Activated Research Company (United States) US

11
Publications
428
Citations
8
H-Index
8
i10-Index
0
2yr Mean Cite
-
Cite/Paper
Data combined from OpenAlex + Semantic Scholar. OA = OpenAlex S2 = Semantic Scholar
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Publication & Citation Trends

Publications

11 total

World׳s largest sapphire for many applications

C. P. Khattak, Raj Shetty, C. R. Schwerdtfeger, Saurabh J. Ullal - Journal of Crystal Growth, 2015
Cited by 60 OpenAlex

20-inch diameter CHES® sapphire boules

C. P. Khattak, Joshua Filgate, Raj Shetty, C. R. Schwerdtfeger, Saurabh J. Ullal - Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2015
Cited by 1 OpenAlex

Latest developments of large-diameter c-axis sapphire grown by CHES method

C. R. Schwerdtfeger, Saurabh J. Ullal, Raj Shetty, Joshua Filgate, G. Dhanaraj - Journal of Crystal Growth, 2013
Cited by 7 OpenAlex

Relation between the ion flux, gas phase composition, and wall conditions in chlorine plasma etching of silicon

Saurabh J. Ullal, Tae Won Kim, Vahid Vahedi, Eray S. Aydil - Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, 2003
Cited by 34 OpenAlex

Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor

Saurabh J. Ullal, Anna R. Godfrey, Erik A. Edelberg, L. B. Braly, Vahid Vahedi et al. - Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, 2002
Cited by 117 OpenAlex

Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl2/O2 plasma etching of Si

Saurabh J. Ullal, Harmeet Singh, J. E. Daugherty, Vahid Vahedi, Eray S. Aydil - Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, 2002
Cited by 80 OpenAlex

Deposition of silicon oxychloride films on chamber walls during Cl2/O2 plasma etching of Si

Saurabh J. Ullal, Harmeet Singh, Vahid Vahedi, Eray S. Aydil - Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, 2002
Cited by 48 OpenAlex

Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks

Saurabh J. Ullal, Harmeet Singh, J. E. Daugherty, Vahid Vahedi, Eray S. Aydil - Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, 2002
Cited by 16 OpenAlex

An on-wafer probe array for measuring two-dimensional ion flux distributions in plasma reactors

Tae Won Kim, Saurabh J. Ullal, Vahid Vahedi, Eray S. Aydil - Review of Scientific Instruments, 2002
Cited by 15 OpenAlex

New diagnostic method for monitoring plasma reactor walls: Multiple total internal reflection Fourier transform infrared surface probe

Anna R. Godfrey, Saurabh J. Ullal, L. B. Braly, Erik A. Edelberg, Vahid Vahedi et al. - Review of Scientific Instruments, 2001
Cited by 50 OpenAlex

Research Topics

Semiconductor materials and devices (7) Plasma Diagnostics and Applications (7) Metal and Thin Film Mechanics (4) Diamond and Carbon-based Materials Research (2) Thin-Film Transistor Technologies (2)

Affiliations

University of California, Santa Barbara
US 2003 - 2001
Activated Research Company (United States)
US 2015 - 2015

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